Main Business

We provide cleaning solutions for chemical substances and oxide layer removal generated during semiconductor processes.

Automated system equipment ensures complete drying before output after input and cleaning.

We completely separate chemical cleaning and DI water cleaning spaces to prevent solution mixing.

Chemical solution cleaning equipment (SC)

Chemical Solution Clean (SC Model)

Ultrapure DI water cleaning equipment (S)

DI Water Clean (S Model)

Process

Chemical Cleaning (SC)

2-stage chemical wash, rinse, and air-blow drying process

01
Chemical Wash 1
02
Chemical Wash 2
03
Rinse
04
Dry zone (Air blow)

DI Cleaning (S)

4-stage DI water cleaning followed by air blow and hot air drying for complete moisture removal

01
Wash 1
02
Wash 2
03
Rinse
04
Final Rinse
05
Dry zone (Air blow)
06
Dry zone (Heater / Hot air system)